Análisis del método de TSC para la obtención de la DOS en materiales semiconductores.
Keywords:
Semiconductores, películas delgadas, DOS. (es)Semiconductors, Thin Films, DOS. (en)
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En este trabajo, se presenta un estudio detallado del método de la conductividad térmicamente estimulada (TSC) para la obtención de la densidad de estados (DOS) a partir de mediciones experimentales. Se obtiene la DOS en muestras de silicio microcristalino dopadas con Boro [μc-Si:H (B)] y se compara con los resultados obtenidos a partir de métodos de fotoconductividad modulada. Para explicar la discrepancia entre la DOS obtenida por TSC y la obtenida por los otros métodos, se muestra a partir de simulaciones que la DOS es muy sensible al error experimental introducido en el cálculo del producto μnτn (movilidad del electrón × tiempo de vida del electrón).
In this work, a detailed study of thermally stimulated con- ductivity technique (TSC) is presented. Density of states (DOS) was obtained from the experimental measurements on boron-doped microcrystalline silicon samples [μc-Si:H (B)] and compared with results obtained by the modula- ted photoconductivity methods. To explain the poor agree- ment between the DOS obtained from the TSC and the other methods, it is shown by means of numerical simula- tions that the DOS is very sensitive to experimental errors introduced in the calculation of the μnτn product (mobility of electron × lifetime of the electron).
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