The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films
Resistencia a la corrosión y microestructura de recubrimientos de NbxSiyNz depositadas con el sistema UBM
Keywords:
Corrosion, diffraction, spectroscopy, fluorescence, microstructure, microscopy, race track, x ray, thin film, sputtering, polarisation (en)Corrosión, Difracción, Espectroscopia, Fluorescencia, Microestructura, Microscopia, race track, Rayos X, Recubrimientos, Sputtering, Polarización (es)
NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascertained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A microstructural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance.
En este trabajo se produjeron recubrimientos nanoestructurados de NbxSiyNz sobre acero inoxidable AISI 304 mediante la técnica del UBM (unbalanced magnetrón - sputtering con magnetrón desbalanceado), variando el contenido de Si, y se evaluó su resistencia frente al fenómeno corrosivo por medio de la técnica de polarización potenciodinámica en una solución al 3% de NaCl. La microestructura de los recubrimientos se analizó por medio de XRD (X ray diffraction - difracción de rayos X), SEM (scanning electron microscopy - microscopia electrónica de barrido) y microscopia láser confocal. La composición química se identificó con la técnica XRF (X ray fluorescence - fluorescencia de rayos X). Como resultado las tasas de depósito se incrementaron con la adición de Si, además se observó un cambio en la microestructura para contenidos superiores a 5% de Si, mediante la transición de un recubrimiento cristalino a amorfo. Finalmente, los resultados de corrosión sugieren que los recubrimientos con un alto contenido de silicio tienen un mejor comportamiento frente a la corrosión del sistema.
Downloads
References
S.H Ahn, Y. S. Choi, J.G Kim, J.G Han, A study on corrosion resistance characteristics of PVD Cr-N coated steels by electrochemical method. Surface and Coatings Technology Vol.150, No.2-3, 2002, pp. 319-326.
S.H Ahn, J.H Lee, H.G Kim, J.G Kim. A study on the quantitative determination of through-coating porosity in PVD-grown coatings, Applied Surface Science, Vol.233, No. 1-4, 2004, pp. 105-114.
S.H. Ahn, J.H. Lee, J.G. Kim, J.G. Han, Localized corrosion mechanisms of the multilayered coatings related to growth defects, Surface and Coatings Technology, V 177-178: 2004 638-644.
J. Wesley Cox. "Wear and Corrosion Resistant Hard Coatings for Non-Cutting Tool Applications". William Andrew Publishing/ Noyes, p. 411. New Jersey, U.S.A. 2001.
D. Depla, S. Mahieu, R. De Gryse. "Magnetron sputter deposition: Linking discharge voltage with target properties." Thin Solid Films, Vol. 517, No.9, 2009, pp. 2825-2839.
D. Deplaa, H. Tomaszewskib, G. Buylea, R. De Gryse, Influence of the target composition on the discharge voltage during magnetron sputtering, Surface and Coatings Technology, Vol. 201, No. 3-4, 2006, pp. 848-854.
Ding, X. Z., X. T. Zeng, Liu, Y. C., Yang, Q., Zhao, L. R., Structure and Mechanical Properties of Ti-Si-N Films Deposited by Combined DC/RF Reactive Unbalanced Magnetron Sputtering, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 6, 2004, pp. 2351-2355.
Dong Y., Liu Y., Dai J., Li G., Superhard Nb-Si-N composite films synthesized by reactive magnetron sputtering, Applied Surface Science, Vol. 252, No.14, 2006, pp. 5215-5219.
Eufinger, K., H. Tomaszewski, Depla D., Poelman H., Poelman D., De Gryse R., The d.c. magnetron sputtering behavior of TiO2-x targets with added Fe2O3 or Nd2O3. Thin Solid Films, Vol. 515, No.2, 2006, 683-686.
Fenker, M., Balzer M., Büchi R.V, Jehn H.A, Kappl H, Lee J.-J, Deposition of NbN thin films onto high-speed steel using reactive magnetron sputtering for corrosion protective applications. Surface and Coatings Technology, Vol.163-164, 2003, pp. 169-175.
Fu, T., Shen Y. G., Zhou Z.F., Li K.Y., Surface morphology of sputter deposited W-Si-N composite coatings characterized by atomic force microscopy, Materials Science and Engineering: B, Vol. 123, No.2, 2005, pp.158-162.
License
Copyright (c) 2012 Leonardo Velasco Estrada, Jhon Jairo Olaya Florez, Rodolfo Rodríguez Baracaldo

This work is licensed under a Creative Commons Attribution 4.0 International License.
The authors or holders of the copyright for each article hereby confer exclusive, limited and free authorization on the Universidad Nacional de Colombia's journal Ingeniería e Investigación concerning the aforementioned article which, once it has been evaluated and approved, will be submitted for publication, in line with the following items:
1. The version which has been corrected according to the evaluators' suggestions will be remitted and it will be made clear whether the aforementioned article is an unedited document regarding which the rights to be authorized are held and total responsibility will be assumed by the authors for the content of the work being submitted to Ingeniería e Investigación, the Universidad Nacional de Colombia and third-parties;
2. The authorization conferred on the journal will come into force from the date on which it is included in the respective volume and issue of Ingeniería e Investigación in the Open Journal Systems and on the journal's main page (https://revistas.unal.edu.co/index.php/ingeinv), as well as in different databases and indices in which the publication is indexed;
3. The authors authorize the Universidad Nacional de Colombia's journal Ingeniería e Investigación to publish the document in whatever required format (printed, digital, electronic or whatsoever known or yet to be discovered form) and authorize Ingeniería e Investigación to include the work in any indices and/or search engines deemed necessary for promoting its diffusion;
4. The authors accept that such authorization is given free of charge and they, therefore, waive any right to receive remuneration from the publication, distribution, public communication and any use whatsoever referred to in the terms of this authorization.









